DIRECT PATTERN REPLICATION IN PLASMA DEPOSITED SILICON-NITRIDE FILMS BY 193 NM ARF EXCIMER LASER-INDUCED SUPPRESSION OF ETCHING

被引：3

作者：

DONNELLY, VM

MUCHA, JA

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 16期

关键词：

D O I：

10.1063/1.101315

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1567 / 1569

页数：3

共 15 条

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