APPLICATIONS OF A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM

被引：12

作者：

NARUM, DH ^{[1
]}

PEASE, RFW ^{[1
]}

机构：

[1] STANFORD UNIV,SOLID STATE ELECTR LAB,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584096

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2115 / 2119

页数：5

共 17 条

[1] A UNIVERSAL RELATION FOR THE SPUTTERING YIELD OF MONATOMIC SOLIDS AT NORMAL ION INCIDENCE [J].

BOHDANSKY, J .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1984, 2 (1-3) :587-591

[2]

GOLDSMITH A, 1961, HDB THERMOPHYSICAL P, V1

[3] MICROMACHINING OF OPTICAL STRUCTURES WITH FOCUSED ION-BEAMS [J].

HARRIOTT, LR ;

SCOTTI, RE ;

CUMMINGS, KD ;

AMBROSE, AF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :207-210

[4] APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J].

HEARD, PJ ;

CLEAVER, JRA ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :87-90

[5] NEW TECHNIQUES FOR MODELING FOCUSED ION-BEAMS [J].

NARUM, DH ;

PEASE, RFW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :154-158

[6] A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM FOR INSITU MICROFABRICATION [J].

NARUM, DH ;

PEASE, RFW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03) :966-973

[7]

NARUM DH, 1988, THESIS STANFORD U

[8]

PEASE RFW, 1967, 9TH IEEE S EL ION LA, P176

[9] FOCUSED-ION-BEAM MICROMACHINED ALGAAS SEMICONDUCTOR-LASER MIRRORS [J].

PURETZ, J ;

DEFREEZ, RK ;

ELLIOTT, RA ;

ORLOFF, J .

ELECTRONICS LETTERS, 1986, 22 (13) :700-702

[10]

SAMSONOV VG, 1968, HDB PHYSICOCHEMICAL

← 1 2 →