KINETICS OF HIGH-PRESSURE OXIDATION OF SILICON IN PYROGENIC STEAM

被引：61

作者：

RAZOUK, RR

LIE, LN

DEAL, BE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 10期

关键词：

D O I：

10.1149/1.2127220

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2214 / 2220

页数：7

共 15 条

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