ROLE OF HOMOGENEOUS REACTIONS IN CHEMICAL VAPOR DEPOSITION

被引：68

作者：

SLADEK, KJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1971年 / 118卷 / 04期

关键词：

D O I：

10.1149/1.2408134

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：654 / &

共 10 条

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SCHAFFER PS, 1965, AD616914

[10] DEPOSITION OF SILICON NITRIDE FILMS BY SILANE-HYDRAZINE PROCESS [J].

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