PHYSICAL AND CHEMICAL PROPERTIES OF ALUMINUM-OXIDE FILM DEPOSITED BY ALCL3-CO2-H2 SYSTEM

被引：57

作者：

IIDA, K

TSUJIDE, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1972年 / 11卷 / 06期

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D O I：

10.1143/JJAP.11.840

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：840 / &

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