ELECTRON-MOBILITY IN SI INVERSION-LAYERS

被引：49

作者：

MASAKI, K

HAMAGUCHI, C

TANIGUCHI, K

IWASE, M

机构：

[1] OSAKA UNIV,FAC ENGN,DEPT ELECT ENGN,SUITA,OSAKA 565,JAPAN

[2] TOSHIBA CO LTD,ULSI RES CTR,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.1856

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1856 / 1863

页数：8

共 28 条

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[10]

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