ISLAND-EDGE EFFECTS IN C-MOS-SOS TRANSISTORS

被引:25
作者
LEE, SN
KJAR, RA
KINOSHITA, G
机构
关键词
D O I
10.1109/T-ED.1978.19209
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:971 / 978
页数:8
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共 13 条
[1]   THIN-FILM SILICON - PREPATATION, PROPERTIES, AND DEVICE APPLICATIONS [J].
ALLISON, JF ;
DUMIN, DJ ;
HEIMAN, FP ;
MUELLER, CW ;
ROBINSON, PH .
PROCEEDINGS OF THE IEEE, 1969, 57 (09) :1490-+
[2]  
FLATLEY DW, 1974, P ELECTROCHEM SOC M, P487
[3]  
HAGAN PJ, 1965, LATEST CONCEPTS SYST
[4]   RADIATION-INDUCED LEAKAGE CURRENT IN N-CHANNEL SOS TRANSISTORS [J].
KJAR, RA ;
PEEL, J .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1974, NS21 (06) :208-210
[5]  
KUHLMAN GJ, 1975, OCT EL SOC M DALL
[6]   SOS ISLAND EDGE PROFILES FOLLOWING OXIDATION [J].
LEE, SN ;
KJAR, RA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, :34-37
[7]   THERMAL REDISTRIBUTION OF IMPURITIES IN SILICON-ON-SAPPHIRE - THEORETICAL DEVELOPMENT [J].
MALDONADO, CD ;
MANDEL, G ;
KINOSHITA, G .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (06) :2269-2276
[8]   SINGLE-CRYSTAL SILICON ON SAPPHIRE SUBSTRATE [J].
MANASEVIT, HM ;
SIMPSON, WI .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) :1349-&
[9]   CARRIER MULTIPLICATION IN PINCHOFF REGION OF MOS TRANSISTORS [J].
MARTINOT, H ;
ROSSEL, P .
ELECTRONICS LETTERS, 1971, 7 (5-6) :118-&
[10]   GROWN-FILM SILICON TRANSISTORS ON SAPPHIRE [J].
MUELLER, CW ;
ROBINSON, PH .
PROCEEDINGS OF THE IEEE, 1964, 52 (12) :1487-&