SERIAL COSPUTTERING OF SOME METAL-ALLOYS - ENHANCEMENT OF PARTIAL SPUTTERING YIELDS OF LIGHT-METALS

被引：8

作者：

BELKIND, A ^{[1
]}

ORBAN, Z ^{[1
]}

BERG, S ^{[1
]}

CARLSSON, P ^{[1
]}

机构：

[1] UNIV UPPSALA,S-75121 UPPSALA,SWEDEN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 02期

关键词：

D O I：

10.1116/1.578731

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We describe serial cosputtering of Al/W, Ti/W, and Al/Zr metal alloys. Overcoating Al and Ti targets with the heavier metals Zr and W enhances the partial sputtering yield of the host metals. Computer modeling of sputtering from a bilayer structure using a modified T-DYN program indicates mixing of the two elements at the interface that takes place because of recoil implantation. In certain cases, such mixing can lead to the enhancement of the partial sputtering yield of the ground-layer element.

引用

页码：314 / 318

页数：5

共 11 条

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[3]

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