ON THE REACTION-KINETICS IN LASER-INDUCED PHOTOCHEMICAL GAS-PHASE PROCESSING

被引:6
作者
PIGLMAYER, K
BAUERLE, D
机构
来源
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY | 1989年 / 48卷 / 06期
关键词
D O I
10.1007/BF00694679
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:453 / 462
页数:10
相关论文
共 9 条
[1]  
BAUERLE D, 1986, SPRINGER SERIES CHEM, V1
[2]   GAS-PHASE VERSUS SURFACE CONTRIBUTIONS TO PHOTOLYTIC LASER CHEMICAL VAPOR-DEPOSITION RATES [J].
BRAICHOTTE, D ;
VANDENBERGH, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :337-343
[3]   KINETIC-THEORY OF LASER PHOTOCHEMICAL DEPOSITION [J].
CHEN, CJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (06) :3386-3398
[4]   RECOMBINATION OF GROUND STATE HALOGEN ATOMS .2. KINETICS OF OVERALL RECOMBINATION OF CHLORINE ATOMS [J].
CLYNE, MAA ;
STEDMAN, DH .
TRANSACTIONS OF THE FARADAY SOCIETY, 1968, 64 (550P) :2698-&
[5]   FILM GROWTH AND MECHANISM OF LICVD OF CHROMIUM FILMS FROM CR(CO)6 AT 248 NM [J].
KONSTANTINOV, L ;
NOWAK, R ;
HESS, P .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 47 (02) :171-181
[6]   PHOTODEPOSITION RATES OF METAL FROM METAL ALKYLS [J].
KRCHNAVEK, RR ;
GILGEN, HH ;
CHEN, JC ;
SHAW, PS ;
LICATA, TJ ;
OSGOOD, RM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :20-26
[7]   LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .3. COMBINED CW AND PULSED IRRADIATION [J].
KULLMER, R ;
BAUERLE, D .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 47 (04) :377-386
[8]   LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .2. CONTINUOUS IRRADIATION [J].
MOGYOROSI, P ;
PIGLMAYER, K ;
KULLMER, R ;
BAUERLE, D .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :293-299
[9]   ULTRAVIOLET PHOTO-DECOMPOSITION FOR METAL-DEPOSITION - GAS VERSUS SURFACE PHASE PROCESSES [J].
WOOD, TH ;
WHITE, JC ;
THACKER, BA .
APPLIED PHYSICS LETTERS, 1983, 42 (05) :408-410