PLASMA INFLUENCE IN TANTALUM SPUTTERING

被引：7

作者：

CHOUAN, Y ^{[1
]}

COLLOBERT, D ^{[1
]}

机构：

[1] CTR NATL ETUDES TELECOMMUN,DEPT CPM PMT,F-22301 LANNION,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 06期

关键词：

D O I：

10.1063/1.323960

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2274 / 2279

页数：6

共 17 条

[1]

COLLOBERT D, 1975, THESIS U ORSAY

[2]

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[3] FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS [J].

FEINSTEIN, LG ;

HUTTEMANN, RD .

THIN SOLID FILMS, 1973, 16 (02) :129-145

[4] ROLE OF SURFACE HYDROXYLS IN NUCLEATION OF SPUTTERED TANTALUM FILMS [J].

FEINSTEIN, LG ;

HUTTEMANN, RD .

THIN SOLID FILMS, 1972, 12 (02) :S47-+

[5] ANNEALING AND PHASE-STABILITY OF TANTALUM FILMS SPUTTERED IN AR-O2 [J].

FEINSTEIN, LG ;

HUTTEMANN, RD .

THIN SOLID FILMS, 1974, 20 (01) :103-114

[6] PHASES OBSERVED IN OXYGEN-REACTIVE SPUTTERING OF TANTALUM [J].

FEINSTEIN, LG .

APPLIED PHYSICS LETTERS, 1971, 19 (05) :137-+

[7] STRUCTURE AND ELECTRICAL PROPERTIES OF TA FILMS SPUTTERED IN AR-O2 [J].

FEINSTEIN, LG ;

GERSTENBERG, D .

THIN SOLID FILMS, 1972, 10 (01) :79-+

[8]

FEINSTEIN LG, 1972, 32 C PHYS EL ALB

[9] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].

READ, MH ;

ALTMAN, C .

APPLIED PHYSICS LETTERS, 1965, 7 (03) :51-&

[10] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM [J].

READ, MH ;

HENSLER, DH .

THIN SOLID FILMS, 1972, 10 (01) :123-&

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