SILVER INDUCED FORMATION OF SI(111)-ROOT-3X-ROOT-3 STRUCTURE FROM HYDROGENATED AMORPHOUS-SILICON FILM

被引:2
作者
ASHTIKAR, MS
SHARMA, GL
机构
[1] Thin Film Laboratory, Dept. of Physics, Indian Institute of Technology Delhi, New Delhi
关键词
DISORDERED SYSTEMS; SURFACES AND INTERFACES; THIN FILMS; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; ORDER DISORDER EFFECTS;
D O I
10.1016/0038-1098(94)90658-0
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Many metallic films, such as, Al, Au, Pd, Pt deposited on hydrogenated amorphous silicon lead to the formation of crystalline silicon phase at a temperature much lower than its normal crystallization temperature > 600-degrees-C. The present investigation on silver/hydrogenated amorphous silicon interface gives the evidence for the formation of a square-root 3 x square-root 3-Ag structure through transmission electron diffraction. The formation of this structure is thought to be due to the nucleation and growth of silicon crystallites at some preferential sites in the triple system of silicon, silver and hydrogen.
引用
收藏
页码:831 / 834
页数:4
相关论文
共 29 条
[1]   COMPARATIVE-STUDY OF STRUCTURE OF EVAPORATED AND GLOW-DISCHARGE SILICON [J].
BARNA, A ;
BARNA, PB ;
RADNOCZI, G ;
TOTH, L ;
THOMAS, P .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 41 (01) :81-84
[2]  
BERRY WB, 1988, 20TH IEEE PHOT SPEC, V1, P262
[3]   SILICON HYDRIDE ETCH PRODUCTS FROM THE REACTION OF ATOMIC-HYDROGEN WITH SI(100) [J].
GATES, SM ;
KUNZ, RR ;
GREENLIEF, CM .
SURFACE SCIENCE, 1989, 207 (2-3) :364-384
[4]   AL-DOPED AND SB-DOPED POLYCRYSTALLINE SILICON OBTAINED BY MEANS OF METAL-INDUCED CRYSTALLIZATION [J].
GONG, SF ;
HENTZELL, HTG ;
ROBERTSSON, AE ;
HULTMAN, L ;
HORNSTROM, SE ;
RADNOCZI, G .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (09) :3726-3732
[5]   HIGH-TEMPERATURE METAL-INDUCED CRYSTALLIZATION OF RF SPUTTERED AMORPHOUS SI THIN-FILMS [J].
GREENE, JE ;
MEI, L .
THIN SOLID FILMS, 1976, 37 (03) :429-440
[6]   INSITU TRANSMISSION ELECTRON-MICROSCOPY STUDIES OF SILICIDE-MEDIATED CRYSTALLIZATION OF AMORPHOUS-SILICON [J].
HAYZELDEN, C ;
BATSTONE, JL ;
CAMMARATA, RC .
APPLIED PHYSICS LETTERS, 1992, 60 (02) :225-227
[7]   SILICIDE FORMATION AND SILICIDE-MEDIATED CRYSTALLIZATION OF NICKEL-IMPLANTED AMORPHOUS-SILICON THIN-FILMS [J].
HAYZELDEN, C ;
BATSTONE, JL .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8279-8289
[8]   FORMATION AND CRYSTALLIZATION OF AMORPHOUS SILICIDES AT THE INTERFACE BETWEEN THIN METAL AND AMORPHOUS-SILICON FILMS [J].
HERD, SR ;
AHN, KY ;
TU, KN .
THIN SOLID FILMS, 1983, 104 (1-2) :197-206
[9]   SURFACE-STRUCTURE STUDY OF SI(111) SQUARE-ROOT-3XSQUARE-ROOT-3-AG BY INCIDENT BEAM ROCKING AES METHOD [J].
HORIO, Y ;
ICHIMIYA, A .
SURFACE SCIENCE, 1985, 164 (2-3) :589-601
[10]   CRYSTALLIZATION OF AMORPHOUS-SILICON DURING THIN-FILM GOLD REACTION [J].
HULTMAN, L ;
ROBERTSSON, A ;
HENTZELL, HTG ;
ENGSTROM, I ;
PSARAS, PA .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (09) :3647-3655