FORMATION OF TITANIUM SILICIDES BY HIGH-DOSE ION-IMPLANTATION

被引：11

作者：

SALVI, VP

VIDWANS, SV

RANGWALA, AA

ARORA, BM

KULDEEP

JAIN, AK

机构：

[1] TATA INST FUNDAMENTAL RES,SOLID STATE ELECTR GRP,BOMBAY 400005,INDIA

[2] BHABHA ATOM RES CTR,DIV NUCL PHYS,BOMBAY 400085,INDIA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 28卷 / 02期

关键词：

D O I：

10.1016/0168-583X(87)90111-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：242 / 246

页数：5

共 17 条

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[2]

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[3]

FERRIS SD, 1979, LASER SOLID INTERACT

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JONES, RE ;

LI, BZ ;

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DAVIS, J .

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[5]

KLUG HP, 1974, XRAY DIFFRACTION PRO, P687

[6] ELECTRONIC TRANSPORT-PROPERTIES OF TISI2 THIN-FILMS [J].

MALHOTRA, V ;

MARTIN, TL ;

MAHAN, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (01) :10-16

[7] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

MAYER, JW ;

TSAUR, BY ;

LAU, SS ;

HUNG, LS .

NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :1-13

[8] SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2 [J].

MURARKA, SP ;

FRASER, DB .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :350-356

[9]

MURARKA SP, 1983, SILICIDES VLSI APPLI

[10] THE MAGNETIC SUSCEPTIBILITY AND ELECTRICAL RESISTIVITY OF SOME TRANSITION METAL SILICIDES [J].

ROBINS, DA .

PHILOSOPHICAL MAGAZINE, 1958, 3 (28) :313-327

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