RAPID CONTACTLESS ELECTRICAL CHARACTERIZATION OF PROCESS-INDUCED DAMAGE IN HGCDTE

被引:2
作者
ELKIND, J
CHEN, MC
机构
[1] Central Research Laboratories, Texas Instruments Inc., Dallas
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 02期
关键词
D O I
10.1116/1.576975
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Microwave reflectance measurements of minority carrier lifetime and eddy-current measurements of conductivity are proposed as rapid, contactless electrical characterization methods for the detection and tracking of process-induced damage in HgCdTe. Changes induced in HgCdTe by ion milling are used to illustrate the utility of the proposed methods. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码:1139 / 1142
页数:4
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