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OXIDATION OF TANTALUM DISILICIDE POLYCRYSTALLINE SILICON STRUCTURES IN DRY O-2
被引:22
作者
:
RAZOUK, RR
论文数:
0
引用数:
0
h-index:
0
RAZOUK, RR
THOMAS, ME
论文数:
0
引用数:
0
h-index:
0
THOMAS, ME
PRESSACCO, SL
论文数:
0
引用数:
0
h-index:
0
PRESSACCO, SL
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1982年
/ 53卷
/ 07期
关键词
:
D O I
:
10.1063/1.329884
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:5342 / 5344
页数:3
相关论文
共 11 条
[1]
TANTALUM SILICIDE FILMS DEPOSITED BY DC SPUTTERING
[J].
ANGILELLO, J
论文数:
0
引用数:
0
h-index:
0
ANGILELLO, J
;
BAGLIN, JEE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JEE
;
CARDONE, F
论文数:
0
引用数:
0
h-index:
0
CARDONE, F
;
DEMPSEY, JJ
论文数:
0
引用数:
0
h-index:
0
DEMPSEY, JJ
;
DHEURLE, FM
论文数:
0
引用数:
0
h-index:
0
DHEURLE, FM
;
IRENE, EA
论文数:
0
引用数:
0
h-index:
0
IRENE, EA
;
MACINNES, R
论文数:
0
引用数:
0
h-index:
0
MACINNES, R
;
PETERSSON, CS
论文数:
0
引用数:
0
h-index:
0
PETERSSON, CS
;
SAVOY, R
论文数:
0
引用数:
0
h-index:
0
SAVOY, R
;
SEGMULLER, AP
论文数:
0
引用数:
0
h-index:
0
SEGMULLER, AP
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF ELECTRONIC MATERIALS,
1981,
10
(01)
:59
-93
[2]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
:3770
-&
[3]
THERMAL-OXIDATION KINETICS OF SILICON IN PYROGENIC H2O AND 5-PERCENT HCL-H2O MIXTURES
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:576
-579
[4]
DELFINO M, COMMUNICATION
[5]
COMPOSITE SILICIDE GATE ELECTRODES - INTERCONNECTIONS FOR VLSI DEVICE TECHNOLOGIES
[J].
GEIPEL, HJ
论文数:
0
引用数:
0
h-index:
0
GEIPEL, HJ
;
HSIEH, N
论文数:
0
引用数:
0
h-index:
0
HSIEH, N
;
ISHAQ, MH
论文数:
0
引用数:
0
h-index:
0
ISHAQ, MH
;
KOBURGER, CW
论文数:
0
引用数:
0
h-index:
0
KOBURGER, CW
;
WHITE, FR
论文数:
0
引用数:
0
h-index:
0
WHITE, FR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1980,
15
(04)
:482
-489
[6]
OXIDATION OF PHOSPHORUS-DOPED LOW-PRESSURE AND ATMOSPHERIC-PRESSURE CVD POLYCRYSTALLINE-SILICON FILMS
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
Hewlett-Packard Laboratories, Palo Alto
KAMINS, TI
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(05)
:838
-844
[7]
SILICIDE FORMATION IN THIN COSPUTTERED (TANTALUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill, NJ 07974, United States
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill, NJ 07974, United States
FRASER, DB
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(03)
:1593
-1598
[8]
OXIDATION OF TANTALUM DISILICIDE ON POLYCRYSTALLINE SILICON
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
FRASER, DB
;
LINDENBERGER, WS
论文数:
0
引用数:
0
h-index:
0
LINDENBERGER, WS
;
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(06)
:3241
-3245
[9]
REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
FRASER, DB
;
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
;
LEVINSTEIN, HJ
论文数:
0
引用数:
0
h-index:
0
LEVINSTEIN, HJ
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1980,
15
(04)
:474
-482
[10]
SARASWAT KC, 1981, JUN EL MAT C SANT BA
←
1
2
→
共 11 条
[1]
TANTALUM SILICIDE FILMS DEPOSITED BY DC SPUTTERING
[J].
ANGILELLO, J
论文数:
0
引用数:
0
h-index:
0
ANGILELLO, J
;
BAGLIN, JEE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JEE
;
CARDONE, F
论文数:
0
引用数:
0
h-index:
0
CARDONE, F
;
DEMPSEY, JJ
论文数:
0
引用数:
0
h-index:
0
DEMPSEY, JJ
;
DHEURLE, FM
论文数:
0
引用数:
0
h-index:
0
DHEURLE, FM
;
IRENE, EA
论文数:
0
引用数:
0
h-index:
0
IRENE, EA
;
MACINNES, R
论文数:
0
引用数:
0
h-index:
0
MACINNES, R
;
PETERSSON, CS
论文数:
0
引用数:
0
h-index:
0
PETERSSON, CS
;
SAVOY, R
论文数:
0
引用数:
0
h-index:
0
SAVOY, R
;
SEGMULLER, AP
论文数:
0
引用数:
0
h-index:
0
SEGMULLER, AP
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF ELECTRONIC MATERIALS,
1981,
10
(01)
:59
-93
[2]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
:3770
-&
[3]
THERMAL-OXIDATION KINETICS OF SILICON IN PYROGENIC H2O AND 5-PERCENT HCL-H2O MIXTURES
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:576
-579
[4]
DELFINO M, COMMUNICATION
[5]
COMPOSITE SILICIDE GATE ELECTRODES - INTERCONNECTIONS FOR VLSI DEVICE TECHNOLOGIES
[J].
GEIPEL, HJ
论文数:
0
引用数:
0
h-index:
0
GEIPEL, HJ
;
HSIEH, N
论文数:
0
引用数:
0
h-index:
0
HSIEH, N
;
ISHAQ, MH
论文数:
0
引用数:
0
h-index:
0
ISHAQ, MH
;
KOBURGER, CW
论文数:
0
引用数:
0
h-index:
0
KOBURGER, CW
;
WHITE, FR
论文数:
0
引用数:
0
h-index:
0
WHITE, FR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1980,
15
(04)
:482
-489
[6]
OXIDATION OF PHOSPHORUS-DOPED LOW-PRESSURE AND ATMOSPHERIC-PRESSURE CVD POLYCRYSTALLINE-SILICON FILMS
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
Hewlett-Packard Laboratories, Palo Alto
KAMINS, TI
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(05)
:838
-844
[7]
SILICIDE FORMATION IN THIN COSPUTTERED (TANTALUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill, NJ 07974, United States
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill, NJ 07974, United States
FRASER, DB
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(03)
:1593
-1598
[8]
OXIDATION OF TANTALUM DISILICIDE ON POLYCRYSTALLINE SILICON
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
FRASER, DB
;
LINDENBERGER, WS
论文数:
0
引用数:
0
h-index:
0
LINDENBERGER, WS
;
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(06)
:3241
-3245
[9]
REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS
[J].
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
;
FRASER, DB
论文数:
0
引用数:
0
h-index:
0
FRASER, DB
;
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
;
LEVINSTEIN, HJ
论文数:
0
引用数:
0
h-index:
0
LEVINSTEIN, HJ
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1980,
15
(04)
:474
-482
[10]
SARASWAT KC, 1981, JUN EL MAT C SANT BA
←
1
2
→