COMPOSITION CHANGES IN SPUTTER DEPOSITION OF Y-BA-CU-O FILMS

被引:2
作者
HOSHI, Y [1 ]
NAOE, M [1 ]
机构
[1] TOKYO INST TECHNOL,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1109/20.42353
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:3518 / 3520
页数:3
相关论文
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