THE RESIDUAL-STRESS IN TIN FILMS DEPOSITED ONTO CEMENTED CARBIDE BY HIGH-RATE REACTIVE SPUTTERING

被引：30

作者：

PERRY, AJ ^{[1
]}

JAGNER, M ^{[1
]}

SPROUL, WD ^{[1
]}

RUDNIK, PJ ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,BASIC IND RES LAB,EVANSTON,IL 60201

来源：

SURFACE & COATINGS TECHNOLOGY | 1989年 / 39卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(89)90071-6

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：387 / 395

页数：9

共 17 条

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[2]

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[7] THE RELATIONSHIP BETWEEN RESIDUAL-STRESS, X-RAY ELASTIC-CONSTANTS AND LATTICE-PARAMETERS IN TIN FILMS MADE BY PHYSICAL VAPOR-DEPOSITION [J].

PERRY, AJ .

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[8] STATES OF RESIDUAL-STRESS BOTH IN FILMS AND IN THEIR SUBSTRATES [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2801-2808

[9] VARIATIONS IN THE REFLECTANCE OF TIN, ZRN AND HFN [J].

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[10] RESIDUAL-STRESS IN PHYSICALLY VAPOR-DEPOSITED FILMS - A STUDY OF DEVIATIONS FROM ELASTIC BEHAVIOR [J].

PERRY, AJ ;

JAGNER, M .

THIN SOLID FILMS, 1989, 171 (01) :197-216

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