ATOMIC-FORCE-MICROSCOPIC STUDY OF HETEROEPITAXIAL DIAMOND NUCLEATION ON (100) SILICON

被引:57
作者
JIANG, X
SCHIFFMANN, K
WESTPHAL, A
KLAGES, CP
机构
[1] Fraunhofer-Institut für Schicht- und Oberflächentechnik (FhG-IST), D-22527 Hamburg
关键词
D O I
10.1063/1.109771
中图分类号
O59 [应用物理学];
学科分类号
摘要
To understand the mechanism of heteroepitaxial diamond growth, the early stage of diamond nucleation, generated in a microwave plasma on negatively biased single crystalline (100) silicon substrates, was observed by atomic force microscopy. The results show that nonfacetted nuclei are initially formed whose size increases with deposition time. Reflection high energy electron diffraction reveals that the nuclei are of crystalline structure in spite of their very small height of about 5 nm. A critical radius of the nuclei r(c) seems to exist under conditions applied in this study. The initial nuclei have a preferential (100 orientation. By a proper control of the nucleation and growth process, however, one can allow the epitaxially generated nuclei to reach r(c) and to grow larger.
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页码:1203 / 1205
页数:3
相关论文
共 16 条
  • [1] ANGUS JC, 1991, DIAMOND MATERIALS, P125
  • [2] [Anonymous], 1979, PROPERTIES DIAMOND
  • [3] BACHMANN PK, 1988, DIAMOND DIAMOND LIKE, P99
  • [4] DIRECT OBSERVATION OF CHEMICAL VAPOR-DEPOSITED DIAMOND FILMS BY ATOMIC FORCE MICROSCOPY
    BARANAUSKAS, V
    FUKUI, M
    RODRIGUES, CR
    PARIZOTTO, N
    TRAVAAIROLDI, VJ
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (13) : 1567 - 1589
  • [5] DIAMOND CHEMICAL VAPOR-DEPOSITION
    CELII, FG
    BUTLER, JE
    [J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1991, 42 (01) : 643 - 684
  • [6] DIAMOND ELECTRONIC DEVICES - A CRITICAL-APPRAISAL
    COLLINS, AT
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (08) : 605 - 611
  • [7] INFLUENCE OF SUBSTRATE TOPOGRAPHY ON THE NUCLEATION OF DIAMOND THIN-FILMS
    DENNIG, PA
    STEVENSON, DA
    [J]. APPLIED PHYSICS LETTERS, 1991, 59 (13) : 1562 - 1564
  • [8] EPITAXIAL DIAMOND THIN-FILMS ON (001) SILICON SUBSTRATES
    JIANG, X
    KLAGES, CP
    ZACHAI, R
    HARTWEG, M
    FUSSER, HJ
    [J]. APPLIED PHYSICS LETTERS, 1993, 62 (26) : 3438 - 3440
  • [9] HETEROEPITAXIAL DIAMOND GROWTH ON (100) SILICON
    JIANG, X
    KLAGES, CP
    [J]. DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) : 1112 - 1113
  • [10] THE EFFECT OF SUBSTRATE BIAS VOLTAGE ON THE NUCLEATION OF DIAMOND CRYSTALS IN A MICROWAVE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION PROCESS
    JIANG, X
    SIX, R
    KLAGES, CP
    ZACHAI, R
    HARTWEG, M
    FUSSER, HJ
    [J]. DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) : 407 - 412