CHARACTERIZATION OF LPCVD AND PECVD SILICON OXYNITRIDE FILMS

被引：20

作者：

HABRAKEN, FHPM

机构：

来源：

APPLIED SURFACE SCIENCE | 1987年 / 30卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(87)90092-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：186 / 196

页数：11

共 35 条

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