DATA-PROCESSING FOR RBS TOMOGRAPHY ANALYSIS

被引:3
作者
TAKAI, M [1 ]
KATAYAMA, Y [1 ]
KINOMURA, A [1 ]
机构
[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
关键词
D O I
10.1016/0168-583X(93)95548-J
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Deformation of images obtained by RBS tomography analysis due to RBS kinematics has been corrected by data processing. Semiconductor-on-insulator structures and two layers of metal patterns isolated by an insulating layer were analyzed by nuclear microprobes using RBS tomography. Simple methods for detecting the leading edge and spectral width facilitate data processing for the semiconductor-on-insulator structure. Energy shift correction due to the difference in beam paths enables adjustment of the deformation arising from RBS kinematics for multilayered metal structures.
引用
收藏
页码:229 / 233
页数:5
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