A MICROBEAM LINE FOR MEDIUM-ENERGY ION-BEAMS

被引：15

作者：

TAKAI, M

MATSUO, T

KINOMURA, A

NAMBA, S

INOUE, K

ISHIBASHI, K

KAWATA, Y

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

[2] KOBE STEEL LTD,CTR ELECTR TECHNOL,KOBE,HYOGO 67302,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 45卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(90)90898-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A microbeam line for analysis with adjustable objective slits and a magnetic quadrupole doublet was designed and installed in a beam line connected with a medium-current ion implanter (Disktron accelerator) with an energy of 500 keV. The dependence of excitation currents and rotational misalignments for each of the magnets on the final beam spot size was investigated. The results were compared with those estimated by a Monte Carlo procedure for the final beam spot profile. A minimum beam spot size of 0.7 μm × 0.9 μm for 400 keV helium ion beams was obtained. A typical beam current was 100 pA for a spot size of 1 μm × 1 μm. Secondary-electron and RBS mapping images using the microprobe with 400 keV helium ions were obtained. © 1990.

引用

页码：553 / 556

页数：4

共 10 条

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[4] MICROBEAM LINE WITH 1.5 MEV HELIUM-IONS AND PROTONS AT OSAKA [J].

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 30 (04) :580-591

[5] MAGNETIC ANALYSIS OF QUADRUPOLE LENS FOR MEV ION MICROPROBE [J].

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[7] MICROBEAMLINE DESIGN FOR MEDIUM TO HIGH-ENERGY HELIUM ION-BEAMS [J].

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 30 (03) :260-264

[10] LASER-INDUCED THERMOCHEMICAL MASKLESS-ETCHING OF III-V COMPOUND SEMICONDUCTORS IN CHLORIDE GAS ATMOSPHERE [J].

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NAMBA, S .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :305-312

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