EXPOSURE INSTRUMENTATION FOR THE APPLICATION OF X-RAY-LITHOGRAPHY USING SYNCHROTRON RADIATION

被引：3

作者：

OERTEL, H

HUBER, HL

SCHMIDT, M

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1989年 / 60卷 / 07期

关键词：

D O I：

10.1063/1.1140803

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：2140 / 2143

页数：4

共 10 条

[1] RESOLUTION LIMITS IN X-RAY-LITHOGRAPHY CALCULATED BY MEANS OF X-RAY-LITHOGRAPHY SIMULATOR XMAS
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HEINRICH, K
HEUBERGER, A
HUBER, H
OERTEL, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 248 - 252
[2] CULLMAN E, 1989, REV SCI INS, V60
[3] Doemens G., 1986, Microelectronic Engineering, V5, P89, DOI 10.1016/0167-9317(86)90034-1
[4] Dossel K.-F., 1986, Microelectronic Engineering, V5, P97, DOI 10.1016/0167-9317(86)90035-3
[5] DEFECTS IN X-RAY MASKS - DETECTION AND PRINTABILITY
KLUWE, A
MULLER, KH
BETZ, H
OERTEL, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 262 - 265
[6] APPLICATION OF THE SIMULATOR 'XMAS' ON SPECIFIC PROBLEMS IN SUB-HALF-MICRON LITHOGRAPHY.
Oertel, H.
Betz, H.
Heuberger, A.
[J]. Microelectronic Engineering, 1985, 3 (1-4) : 387 - 394
[7] DEVELOPMENT OF HIGHLY RELIABLE SYNCHROTRON RADIATION LITHOGRAPHY BEAMLINE
OKADA, K
FUJII, K
KAWASE, Y
NAGANO, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 191 - 194
[8] SOFT-X-RAY DOSIMETRY AND ITS APPLICATION ON THE LITHOGRAPHY BEAMLINE AT SSRL
SELIGSON, D
PAN, L
KING, P
PIANETTA, P
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1988, 266 (1-3) : 612 - 618
[9] FABRICATION OF FULLY SCALED 0.5-MU-M N-TYPE METAL-OXIDE SEMICONDUCTOR TEST DEVICES USING SYNCHROTRON X-RAY-LITHOGRAPHY - OVERLAY, RESIST PROCESSES, AND DEVICE FABRICATION
SILVERMAN, JP
DIMILIA, V
KATCOFF, D
KWIETNIAK, K
SEEGER, D
WANG, LK
WARLAUMONT, JM
WILSON, AD
CROCKATT, D
DEVENUTO, R
HILL, B
HSIA, LC
RIPPSTEIN, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2147 - 2152
[10] WEIHRETER E, 1988, P EUROPEAN PARTICLE

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