THRESHOLD ENERGY FOR SPUTTERING AND ITS DEPENDENCE ON ANGLE OF INCIDENCE

被引：77

作者：

ECKSTEIN, W ^{[1
]}

GARCIAROSALES, C ^{[1
]}

ROTH, J ^{[1
]}

LASZLO, J ^{[1
]}

机构：

[1] TECH UNIV BUDAPEST,H-1521 BUDAPEST,HUNGARY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 83卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(93)95913-P

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The sputtering yield at low energies and at various angles of incidence is investigated by computer simulation with the program TRIM.SP and compared to available experimental data. The question of the sputtering threshold energy is discussed in detail, and the processes responsible for sputtering at these low energies are studied. It is shown that for heavy ion sputtering the threshold depends on the angle of incidence. Analytic equations are derived which demonstrate that the inelastic energy loss plays an important role for the threshold energy for heavy projectiles.

引用

页码：95 / 109

页数：15

共 30 条

[1] LIGHT-ION SPUTTERING YIELDS FOR MOLYBDENUM AND GOLD AT LOW ENERGIES [J].