APPLICATION OF A CF3+ PRIMARY ION-SOURCE FOR DEPTH PROFILING IN SECONDARY ION MASS-SPECTROMETRY

被引：12

作者：

REUTER, W

SCILLA, GJ

机构：

来源：

ANALYTICAL CHEMISTRY | 1988年 / 60卷 / 14期

关键词：

D O I：

10.1021/ac00165a011

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：1401 / 1404

页数：4

共 11 条

[1] DEVELOPMENTS IN SECONDARY ION MASS-SPECTROSCOPY AND APPLICATIONS TO SURFACE STUDIES [J].

BENNINGHOVEN, A .

SURFACE SCIENCE, 1975, 53 (DEC) :596-625

[2]

Benninghoven A., 1987, SECONDARY ION MASS S

[3] PROFILE DISTORTION IN SIMS [J].

BOUDEWIJN, PR ;

AKERBOOM, HWP ;

KEMPENERS, MNC .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1984, 39 (12) :1567-1571

[4] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J].

COBURN, JW ;

WINTERS, HF ;

CHUANG, TJ .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3532-3540

[5] SYSTEM FOR COMBINED SIMS-AES-XPS STUDIES OF SOLIDS [J].

FRISCH, MA ;

REUTER, W ;

WITTMAACK, K .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1980, 51 (06) :695-704

[6] THE APPLICATION OF DOPPLER-SHIFT LASER FLUORESCENCE SPECTROSCOPY FOR THE DETECTION AND ENERGY ANALYSIS OF PARTICLES EVOLVING FROM SURFACES [J].

HUSINSKY, W .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05) :1546-1559

[7] SECONDARY ION EMISSION FROM METAL TARGETS UNDER CF3+ AND O-2+ BOMBARDMENT [J].

REUTER, W .

ANALYTICAL CHEMISTRY, 1987, 59 (17) :2081-2087

[8] POSITIVE SECONDARY-ION EMISSION FROM FE-NI ALLOYS UNDER O-2+ BOMBARDMENT AT 45-DEGREES INCIDENCE [J].

REUTER, W ;

YU, ML .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (05) :3784-3786

[9]

REUTER W, 1986, NUCL INSTRUM METHO B, V15, P3

[10] LOW-ENERGY ION-BEAM TRANSPORT THROUGH APERTURES [J].

WITTMAACK, K .

NUCLEAR INSTRUMENTS & METHODS, 1977, 143 (01) :1-6

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