THEORETICAL AND EXPERIMENTAL INVESTIGATIONS OF CHLORINE RF GLOW-DISCHARGES .2. EXPERIMENTAL

被引:33
作者
AYDIL, ES [1 ]
ECONOMOU, DJ [1 ]
机构
[1] UNIV HOUSTON,DEPT CHEM ENGN,HOUSTON,TX 77204
关键词
D O I
10.1149/1.2069420
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Key plasma properties of a 13.56 MHz chlorine glow discharge were measured using several plasma diagnostic techniques. Electron density and energy, self-sustained electric field, RF current flowing through the plasma, ion bombardment energy, and atomic chlorine concentration were measured as a function of reactor operating conditions. The experimental data were compared to the predictions of a plasma reactor model which included details of the bulk plasma. Good agreement between the measured and predicted values of all the above plasma properties was obtained over a range of pressure, power, and electrode spacing without adjusting any reaction rate coefficients.
引用
收藏
页码:1406 / 1412
页数:7
相关论文
共 42 条
[1]   THE PLASMA-ETCHING OF POLYSILICON WITH CF3CL/ARGON DISCHARGES .1. PARAMETRIC MODELING AND IMPEDANCE ANALYSIS [J].
ALLEN, KD ;
SAWIN, HH ;
MOCELLA, MT ;
JENKINS, MW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (11) :2315-2325
[2]   THE PLASMA-ETCHING OF POLYSILICON WITH CF3CL/ARGON DISCHARGES .2. MODELING OF ION-BOMBARDMENT ENERGY-DISTRIBUTIONS [J].
ALLEN, KD ;
SAWIN, HH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (11) :2326-2331
[3]  
ALLEN KD, 1986, THESIS MIT
[4]   PLASMAS WITH NEGATIVE-IONS - PROBE MEASUREMENTS AND CHARGE EQUILIBRIUM [J].
AMEMIYA, H .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1990, 23 (08) :999-1014
[5]  
[Anonymous], 1973, MOBILITY DIFFUSION I
[6]  
Auciello O., 1989, PLASMA DIAGNOSTICS
[7]   MULTIPLE STEADY-STATES IN A RADIO-FREQUENCY CHLORINE GLOW-DISCHARGE [J].
AYDIL, ES ;
ECONOMOU, DJ .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (01) :109-114
[8]   THEORETICAL AND EXPERIMENTAL INVESTIGATIONS OF CHLORINE RF GLOW-DISCHARGES .1. THEORETICAL [J].
AYDIL, ES ;
ECONOMOU, DJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (05) :1396-1406
[9]  
AYDIL ES, 1990, ELECTROCHEMICAL SOC, P77
[10]   PROFILE CONTROL WITH DC BIAS IN PLASMA-ETCHING [J].
BRUCE, RH ;
REINBERG, AR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) :393-396