FORMATION OF THE NI-SIC(001) INTERFACE STUDIED BY HIGH-RESOLUTION ION BACKSCATTERING

被引：38

作者：

SLIJKERMAN, WFJ

FISCHER, AEMJ

VANDERVEEN, JF

OHDOMARI, I

YOSHIDA, S

MISAWA, S

机构：

[1] WASEDA UNIV,SCH SCI & ENGN,SHINJUKU KU,TOKYO 160,JAPAN

[2] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 02期

关键词：

D O I：

10.1063/1.343535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：666 / 673

页数：8

共 39 条

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