MAGNETRON PLASMA DIAGNOSTICS AND PROCESSING IMPLICATIONS

被引：31

作者：

ROSSNAGEL, SM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575262

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1821 / 1826

页数：6

共 20 条

[11] CURRENT VOLTAGE RELATIONS IN MAGNETRONS [J].

ROSSNAGEL, SM ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (02) :223-229

[12] INDUCED DRIFT CURRENTS IN CIRCULAR PLANAR MAGNETRONS [J].

ROSSNAGEL, SM ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (01) :88-91

[13] LANGMUIR PROBE CHARACTERIZATION OF MAGNETRON OPERATION [J].

ROSSNAGEL, SM ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1822-1825

[14] CHARGE TRANSPORT IN MAGNETRONS [J].

ROSSNAGEL, SM ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2276-2279

[15]

ROSSNAGEL SM, IN PRESS THIN FILM D

[16] SPATIAL-DISTRIBUTION OF SPUTTERED ATOMS FROM MAGNETRON SOURCE [J].

SWANN, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1750-1754

[17]

TAKAISHI T, 1963, T FARADAY SOC, V59, P2509

[18] THE INFLUENCE OF DISCHARGE CURRENT ON THE INTRINSIC STRESS IN MO FILMS DEPOSITED USING CYLINDRICAL AND PLANAR MAGNETRON SPUTTERING SOURCES [J].

THORNTON, JA ;

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :576-579

[19]

THORNTON JA, 1978, THIN FILM PROCESSES, P76

[20] PLANAR MAGNETRON SPUTTERING [J].

WAITS, RK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :179-187

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