QUANTITATIVE-ANALYSIS OF TI-W FILMS

被引：15

作者：

HARTSOUGH, LD

KOCH, A

MOULDER, J

SIGMON, T

机构：

[1] PERKIN ELMER,DIV INSTRUMENT SALES & SERV,MT VIEW,CA 94049

[2] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 01期

关键词：

D O I：

10.1116/1.570398

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：392 / 395

页数：4

共 17 条

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[8] PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SI SYSTEM
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[9] SPUTTERING OF PTSI
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[10] MAYER JW, 1977, ION BEAM HDB MATERIA