共 102 条
- [41] OXYGEN PLASMA-ETCHING FOR RESIST STRIPPING AND MULTILAYER LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (01): : 1 - 13
- [42] OXIDE FORMATION DURING PLASMA-ETCHING OF SILICON-CONTAINING RESISTS [J]. APPLIED PHYSICS LETTERS, 1989, 54 (16) : 1510 - 1512
- [44] HERB K, 1988, UNPUB 13TH P TEG PLA, P31
- [45] PLASMA-SURFACE INTERACTIONS IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1986, 16 : 163 - 183
- [46] HESS DW, 1989, ADV CHEM SER, V221, P377
- [48] HSIEH JJ, 1989, 6TH P IEEE INT V MIC, P411
- [49] JACKSON RL, 1987, SOLID STATE TECHNOL, V30, P107
- [50] EXPERIMENTAL TESTS OF THE STEADY-STATE MODEL FOR OXYGEN REACTIVE ION ETCHING OF SILICON-CONTAINING POLYMERS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (05): : 2938 - 2944