MAGNETRON PLASMA DEPOSITION PROCESSES

被引：29

作者：

ROSSNAGEL, SM

机构：

来源：

THIN SOLID FILMS | 1989年 / 171卷 / 01期

关键词：

D O I：

10.1016/0040-6090(89)90039-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：125 / 142

页数：18

共 29 条

[1] AN INTERFEROMETRIC INVESTIGATION OF THE THERMALIZATION OF COPPER ATOMS IN A MAGNETRON SPUTTERING DISCHARGE [J].

BALL, LT ;

FALCONER, IS ;

MCKENZIE, DR ;

SMELT, JM .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (03) :720-724

[2] PRODUCTION OF HIGH-ENERGY NEUTRAL ATOMS BY SCATTERING OF IONS AT SOLID SURFACES AND ITS RELATION TO SPUTTERING [J].

BRODIE, I ;

LAMONT, LT ;

JEPSEN, RL .

PHYSICAL REVIEW LETTERS, 1968, 21 (17) :1224-&

[3]

Chapman B., 1980, GLOW DISCHARGE PROCE

[4] REFLECTION OF HEAVY-IONS [J].

ECKSTEIN, W ;

BIERSACK, JP .

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1986, 63 (04) :471-478

[5] REACTIVE DEPOSITION OF LOW-LOSS AL2O3 OPTICAL-WAVEGUIDES BY MODIFIED DC PLANAR MAGNETRON SPUTTERING [J].

ESTE, G ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03) :1238-1247

[6] SOME CALCULATIONS OF THICKNESS DISTRIBUTION OF FILMS DEPOSITED FROM LARGE AREA SPUTTERING SOURCES [J].

GNAEDINGER, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (03) :355-+

[7] SLOWING DOWN AND THERMALIZATION OF SPUTTERED PARTICLE FLUXES - ENERGY-DISTRIBUTIONS [J].

GRASMARTI, A ;

VALLESABARCA, JA .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) :1071-1075

[8] LASER SPECTROSCOPY OF SPUTTERED ATOMS [J].

GRUEN, DM ;

PELLIN, MJ ;

YOUNG, CE ;

CALAWAY, WF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1779-1785

[9] A SPUTTERING WIND [J].

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :561-566

[10] STRESS AND PROPERTY CONTROL IN SPUTTERED METAL-FILMS WITHOUT SUBSTRATE BIAS [J].

HOFFMAN, DW .

THIN SOLID FILMS, 1983, 107 (04) :353-358

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