CHEMICAL VAPOR-DEPOSITION OF A-SI-H FILMS UTILIZING A MICROWAVE EXCITED AR PLASMA STREAM

[1] BIAS EFFECTS ON THE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILM IN A GLOW-DISCHARGE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (04) : 413 - 415

[2] DEPOSITION OF AMORPHOUS SILICON FILMS FROM GLOW-DISCHARGE PLASMAS OF SILANE [J]. THIN SOLID FILMS, 1977, 40 (JAN) : L23 - L25

[3] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[4] AMORPHOUS SILICON SOLAR-CELL [J]. APPLIED PHYSICS LETTERS, 1976, 28 (11) : 671 - 673

[5] CONDUCTION IN NON-CRYSTALLINE SYSTEMS .5. CONDUCTIVITY, OPTICAL ABSORPTION AND PHOTOCONDUCTIVITY IN AMORPHOUS SEMICONDUCTORS [J]. PHILOSOPHICAL MAGAZINE, 1970, 22 (179): : 903 - &

[6] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS [J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 244 - 246

[7] GROWTH-MORPHOLOGY AND DEFECTS IN PLASMA-DEPOSITED A-SI-H FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 159 - 170

[8] EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (05) : 331 - 333

[9] STRUCTURAL INTERPRETATION OF THE VIBRATIONAL-SPECTRA OF A-SI-H ALLOYS [J]. PHYSICAL REVIEW B, 1979, 19 (04): : 2064 - 2073

[10] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L210 - L212

[1] BIAS EFFECTS ON THE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILM IN A GLOW-DISCHARGE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (04) : 413 - 415

[2] DEPOSITION OF AMORPHOUS SILICON FILMS FROM GLOW-DISCHARGE PLASMAS OF SILANE [J]. THIN SOLID FILMS, 1977, 40 (JAN) : L23 - L25

[3] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[4] AMORPHOUS SILICON SOLAR-CELL [J]. APPLIED PHYSICS LETTERS, 1976, 28 (11) : 671 - 673

[5] CONDUCTION IN NON-CRYSTALLINE SYSTEMS .5. CONDUCTIVITY, OPTICAL ABSORPTION AND PHOTOCONDUCTIVITY IN AMORPHOUS SEMICONDUCTORS [J]. PHILOSOPHICAL MAGAZINE, 1970, 22 (179): : 903 - &

[6] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS [J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 244 - 246

[7] GROWTH-MORPHOLOGY AND DEFECTS IN PLASMA-DEPOSITED A-SI-H FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 159 - 170

[8] EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (05) : 331 - 333

[9] STRUCTURAL INTERPRETATION OF THE VIBRATIONAL-SPECTRA OF A-SI-H ALLOYS [J]. PHYSICAL REVIEW B, 1979, 19 (04): : 2064 - 2073

[10] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L210 - L212