A RELATION BETWEEN EL2 (EC-0.81 EV) AND EL6 (EC-0.35 EV) IN ANNEALED HB-GAAS BY HYDROGEN PLASMA EXPOSURE

被引：15

作者：

CHO, HY

KIM, EK

MIN, SK

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 07期

关键词：

D O I：

10.1063/1.344189

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3038 / 3041

页数：4

共 28 条

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