RE-EMISSION OF SPUTTERED SIO2 DURING GROWTH AND ITS RELATION TO FILM QUALITY

被引：52

作者：

MAISSEL, LI

JONES, RE

STANDLEY, CL

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1970年 / 14卷 / 02期

关键词：

D O I：

10.1147/rd.142.0176

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

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页码：176 / &

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