DENSE-PLASMA PRODUCTION AND FILM DEPOSITION BY NEW HIGH-RATE SPUTTERING USING AN ELECTRIC MIRROR

被引：13

作者：

MATSUOKA, M

ONO, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.575768

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：2652 / 2657

页数：6

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