GERMANIUM AND SILICON ION-BEAM DEPOSITION

被引：30

作者：

MIYAKE, K

TOKUYAMA, T

机构：

来源：

THIN SOLID FILMS | 1982年 / 92卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(82)90194-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：123 / 129

页数：7

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