MICROSTRUCTURE OF ZNO FILMS PRODUCED BY REACTIVE DC SPUTTERING TECHNIQUE

被引：34

作者：

GHOSH, S

SARKAR, A

BHATTACHARYA, S

CHAUDHURI, S

PAL, AK

机构：

[1] Department of Materials Science, Indian Association for the Cultivation of Science, Calcutta

来源：

JOURNAL OF CRYSTAL GROWTH | 1991年 / 108卷 / 3-4期

关键词：

D O I：

10.1016/0022-0248(91)90231-S

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

The effect of grain growth of zinc oxide films deposited by using a reactive DC magnetron sputtering technique was studied as a function of annealing temperature. The results are correlated with the observed electrical and optical studies.

引用

页码：534 / 540

页数：7

共 14 条

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