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COMPARISON OF MOS CAPACITOR AND TRANSISTOR POSTIRRADIATION RESPONSE
被引:32
作者
:
MCWHORTER, PJ
论文数:
0
引用数:
0
h-index:
0
MCWHORTER, PJ
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
PASTOREK, RA
论文数:
0
引用数:
0
h-index:
0
PASTOREK, RA
ZIMMERMAN, GT
论文数:
0
引用数:
0
h-index:
0
ZIMMERMAN, GT
机构
:
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1989年
/ 36卷
/ 06期
关键词
:
D O I
:
10.1109/23.45371
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1792 / 1799
页数:8
相关论文
共 19 条
[1]
THE APPLICATION OF DEEP LEVEL TRANSIENT SPECTROSCOPY TO THE MEASUREMENT OF RADIATION-INDUCED INTERFACE STATE SPECTRA
[J].
BARNES, C
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
BARNES, C
;
ZIETLOW, T
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
ZIETLOW, T
;
NAKAMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
NAKAMURA, K
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1988,
35
(06)
:1197
-1202
[2]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
[J].
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
:701
-+
[3]
DESCRIPTION OF SIO2-SI INTERFACE PROPERTIES BY MEANS OF VERY LOW FREQUENCY MOS CAPACITANCE MEASUREMENTS
[J].
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
;
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
.
SURFACE SCIENCE,
1971,
28
(01)
:157
-+
[4]
THE RESPONSE OF MOS DEVICES TO DOSE-ENHANCED LOW-ENERGY RADIATION
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
LORENCE, LJ
论文数:
0
引用数:
0
h-index:
0
LORENCE, LJ
;
BEEZHOLD, W
论文数:
0
引用数:
0
h-index:
0
BEEZHOLD, W
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
SCHWANK, JR
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1986,
33
(06)
:1245
-1251
[5]
A REEVALUATION OF WORST-CASE POSTIRRADIATION RESPONSE FOR HARDENED MOS-TRANSISTORS
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
;
TURPIN, DC
论文数:
0
引用数:
0
h-index:
0
TURPIN, DC
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1178
-1183
[6]
A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS
[J].
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
;
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
BELTRAN, N
论文数:
0
引用数:
0
h-index:
0
BELTRAN, N
;
DEKEERSMAECKER, RF
论文数:
0
引用数:
0
h-index:
0
DEKEERSMAECKER, RF
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(01)
:42
-53
[7]
HOLE TRAPS AND TRIVALENT SILICON CENTERS IN METAL-OXIDE SILICON DEVICES
[J].
LENAHAN, PM
论文数:
0
引用数:
0
h-index:
0
LENAHAN, PM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
.
JOURNAL OF APPLIED PHYSICS,
1984,
55
(10)
:3495
-3499
[8]
COMPARISON OF INTERFACE-STATE GENERATION BY 25-KEV ELECTRON-BEAM IRRADIATION IN P-TYPE AND N-TYPE MOS CAPACITORS
[J].
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
MA, TP
;
SCOGGAN, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
SCOGGAN, G
;
LEONE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
LEONE, R
.
APPLIED PHYSICS LETTERS,
1975,
27
(02)
:61
-63
[9]
SIMPLE TECHNIQUE FOR SEPARATING THE EFFECTS OF INTERFACE TRAPS AND TRAPPED-OXIDE CHARGE IN METAL-OXIDE-SEMICONDUCTOR TRANSISTORS
[J].
MCWHORTER, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
MCWHORTER, PJ
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
WINOKUR, PS
.
APPLIED PHYSICS LETTERS,
1986,
48
(02)
:133
-135
[10]
NICOLLIAN EH, 1967, BELL SYST TECH J, V46, P1095
←
1
2
→
共 19 条
[1]
THE APPLICATION OF DEEP LEVEL TRANSIENT SPECTROSCOPY TO THE MEASUREMENT OF RADIATION-INDUCED INTERFACE STATE SPECTRA
[J].
BARNES, C
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
BARNES, C
;
ZIETLOW, T
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
ZIETLOW, T
;
NAKAMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Aerosp Corp, Los Angeles, CA, USA
NAKAMURA, K
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1988,
35
(06)
:1197
-1202
[2]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
[J].
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
:701
-+
[3]
DESCRIPTION OF SIO2-SI INTERFACE PROPERTIES BY MEANS OF VERY LOW FREQUENCY MOS CAPACITANCE MEASUREMENTS
[J].
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
;
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
.
SURFACE SCIENCE,
1971,
28
(01)
:157
-+
[4]
THE RESPONSE OF MOS DEVICES TO DOSE-ENHANCED LOW-ENERGY RADIATION
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
LORENCE, LJ
论文数:
0
引用数:
0
h-index:
0
LORENCE, LJ
;
BEEZHOLD, W
论文数:
0
引用数:
0
h-index:
0
BEEZHOLD, W
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
SCHWANK, JR
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1986,
33
(06)
:1245
-1251
[5]
A REEVALUATION OF WORST-CASE POSTIRRADIATION RESPONSE FOR HARDENED MOS-TRANSISTORS
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
;
TURPIN, DC
论文数:
0
引用数:
0
h-index:
0
TURPIN, DC
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1178
-1183
[6]
A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS
[J].
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
;
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
BELTRAN, N
论文数:
0
引用数:
0
h-index:
0
BELTRAN, N
;
DEKEERSMAECKER, RF
论文数:
0
引用数:
0
h-index:
0
DEKEERSMAECKER, RF
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(01)
:42
-53
[7]
HOLE TRAPS AND TRIVALENT SILICON CENTERS IN METAL-OXIDE SILICON DEVICES
[J].
LENAHAN, PM
论文数:
0
引用数:
0
h-index:
0
LENAHAN, PM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
.
JOURNAL OF APPLIED PHYSICS,
1984,
55
(10)
:3495
-3499
[8]
COMPARISON OF INTERFACE-STATE GENERATION BY 25-KEV ELECTRON-BEAM IRRADIATION IN P-TYPE AND N-TYPE MOS CAPACITORS
[J].
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
MA, TP
;
SCOGGAN, G
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
SCOGGAN, G
;
LEONE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533
LEONE, R
.
APPLIED PHYSICS LETTERS,
1975,
27
(02)
:61
-63
[9]
SIMPLE TECHNIQUE FOR SEPARATING THE EFFECTS OF INTERFACE TRAPS AND TRAPPED-OXIDE CHARGE IN METAL-OXIDE-SEMICONDUCTOR TRANSISTORS
[J].
MCWHORTER, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
MCWHORTER, PJ
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
WINOKUR, PS
.
APPLIED PHYSICS LETTERS,
1986,
48
(02)
:133
-135
[10]
NICOLLIAN EH, 1967, BELL SYST TECH J, V46, P1095
←
1
2
→