GROWTH OF SI AND GE THIN-FILMS BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：8

作者：

ANDREATTA, RW

LUBBEN, D

EDEN, JG

GREENE, JE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期

关键词：

D O I：

10.1116/1.571446

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：740 / 741

页数：2

共 8 条

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BASS, M .

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[5] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J].

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IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) :1233-1243

[6] DEPOSITION OF METAL-FILMS BY THE CONTROLLED DECOMPOSITION OF ORGANOMETALLIC COMPOUNDS ON SURFACES [J].

GEORGE, PM ;

BEAUCHAMP, JL .

THIN SOLID FILMS, 1980, 67 (01) :L25-L28

[7] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J].

HANABUSA, M ;

NAMIKI, A ;

YOSHIHARA, K .

APPLIED PHYSICS LETTERS, 1979, 35 (08) :626-627

[8] LASER PHOTODEPOSITION OF REFRACTORY-METALS [J].

SOLANKI, R ;

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MAHAN, JE ;

COLLINS, GJ .

APPLIED PHYSICS LETTERS, 1981, 38 (07) :572-574

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