VUV-ASSISTED ETCHING OF SILICON(100) AND POLY(METHYL METHACRYLATE)

被引：13

作者：

UENO, N ^{[1
]}

MITSUHATA, T ^{[1
]}

SUGITA, K ^{[1
]}

TANAKA, K ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,OHO,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 09期

关键词：

D O I：

10.1143/JJAP.27.1723

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1723 / 1726

页数：4

共 29 条

[1]

AKASHI K, 1986, HIKARI PURAZUMA PURO, pCH12

[2] SITE-SPECIFIC FRAGMENTATION OF SMALL MOLECULES FOLLOWING SOFT-X-RAY EXCITATION [J].

EBERHARDT, W ;

SHAM, TK ;

CARR, R ;

KRUMMACHER, S ;

STRONGIN, M ;

WENG, SL ;

WESNER, D .

PHYSICAL REVIEW LETTERS, 1983, 50 (14) :1038-1041

[3] LASER CHEMICAL TECHNIQUE FOR RAPID DIRECT WRITING OF SURFACE RELIEF IN SILICON [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

APPLIED PHYSICS LETTERS, 1981, 38 (12) :1018-1020

[4] LASER ABLATION OF ORGANIC POLYMERS - MICROSCOPIC MODELS FOR PHOTOCHEMICAL AND THERMAL-PROCESSES [J].

GARRISON, BJ ;

SRINIVASAN, R .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) :2909-2914

[5] LASER ABLATION OF A POLYSILANE MATERIAL [J].

HANSEN, SG ;

ROBITAILLE, TE .

JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) :1394-1399

[6] PHOTO-ASSISTED ANISOTROPIC ETCHING OF PHOSPHORUS-DOPED POLYCRYSTALLINE SILICON EMPLOYING REACTIVE SPECIES GENERATED BY A MICROWAVE-DISCHARGE [J].

HAYASAKA, N ;

OKANO, H ;

SEKINE, M ;

HORIIKE, Y .

APPLIED PHYSICS LETTERS, 1986, 48 (17) :1165-1166

[7] SYNCHROTRON RADIATION-ASSISTED ETCHING OF SILICON SURFACE [J].

HAYASAKA, N ;

HIRAYA, A ;

SHOBATAKE, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (07) :L1110-L1112

[8] CHARACTERIZATION OF PHOTOCHEMICAL PROCESSING [J].

HIROSE, M ;

YOKOYAMA, S ;

YAMAKAGE, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05) :1445-1449

[9] PLASMA-POLYMERIZED DRY-DEVELOPABLE RESIST FOR SYNCHROTRON RADIATION LITHOGRAPHY [J].

HORI, M ;

YAMADA, H ;

YONEDA, T ;

MORITA, S ;

HATTORI, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) :707-711

[10] DIRECT ENGRAVING ON POSITIVE RESISTS BY SYNCHROTRON RADIATION [J].

ICHIMURA, S ;

HIRATA, M ;

TANINO, H ;

ATODA, N ;

ONO, M ;

HOH, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1076-1079

← 1 2 3 →