DEPOSITION OF TIN-DOPED INDIUM OXIDE-FILMS BY A MODIFIED REACTIVE MAGNETRON SPUTTERING PROCESS

被引：16

作者：

KARIM, AA

DESHPANDEY, C

DOERR, HJ

BUNSHAH, RF

机构：

来源：

THIN SOLID FILMS | 1989年 / 172卷 / 01期

关键词：

D O I：

10.1016/0040-6090(89)90122-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：111 / 121

页数：11

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