ALGAAS-GAAS LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION - A REVIEW

被引：39

作者：

DUPUIS, RD ^{[1
]}

机构：

[1] ROCKWELL INT,ANAHEIM,CA 92803

来源：

JOURNAL OF CRYSTAL GROWTH | 1981年 / 55卷 / 01期

关键词：

D O I：

10.1016/0022-0248(81)90290-6

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：213 / 222

页数：10

共 54 条

[1] SINGLE-LONGITUDINAL-MODE METALORGANIC CHEMICAL-VAPOR-DEPOSITION SELF-ALIGNED GAALAS-GAAS DOUBLE-HETEROSTRUCTURE LASERS [J].

COLEMAN, JJ ;

DAPKUS, PD .

APPLIED PHYSICS LETTERS, 1980, 37 (03) :262-263

[2] HIGH-BARRIER CLUSTER-FREE ALXGA1-XAS-ALAS-GAAS QUANTUM-WELL HETEROSTRUCTURE LASER [J].

COLEMAN, JJ ;

DAPKUS, PD ;

LAIDIG, WD ;

VOJAK, BA ;

HOLONYAK, N .

APPLIED PHYSICS LETTERS, 1981, 38 (02) :63-65

[3] QUANTUM STATES OF CONFINED CARRIERS IN VERY THIN ALXGA1-XAS-GAAS-ALXGA1-XAS HETEROSTRUCTURES [J].

DINGLE, R ;

WIEGMANN, W ;

HENRY, CH .

PHYSICAL REVIEW LETTERS, 1974, 33 (14) :827-830

[4]

Dingle R, 1975, FESTKORPERPROBLEME, V15, P21

[5]

Dupuis R. D., 1979, Soviet Technical Physics Letters, V5, P52

[6] QUANTUM-WELL ALXGA1-XAS-GAAS HETEROSTRUCTURE LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

DUPUIS, RD ;

DAPKUS, PD ;

KOLBAS, RM ;

HOLONYAK, N .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1979, 15 (08) :756-761

[7] ROOM-TEMPERATURE OPERATION OF GA(1-X)ALXAS-GAAS DOUBLE-HETEROSTRUCTURE LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

DUPUIS, RD ;

DAPKUS, PD .

APPLIED PHYSICS LETTERS, 1977, 31 (07) :466-468

[8] PREPARATION AND PROPERTIES OF GA1-XALXAS-GAAS HETEROSTRUCTURE LASERS GROWN BY METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION [J].

DUPUIS, RD ;

DAPKUS, PD .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1979, 15 (03) :128-135

[9] 700-H CONTINUOUS ROOM-TEMPERATURE OPERATION OF ALXGA1-XAS-GAAS HETEROSTRUCTURE LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

DUPUIS, RD .

APPLIED PHYSICS LETTERS, 1979, 35 (04) :311-314

[10] CONTINUOUS ROOM-TEMPERATURE OPERATION OF GA(1-X)ALXAS-GAAS DOUBLE-HETEROSTRUCTURE LASERS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION [J].

DUPUIS, RD ;

DAPKUS, PD .

APPLIED PHYSICS LETTERS, 1978, 32 (07) :406-407

← 1 2 3 4 5 6 →