DIFFUSION OF GOLD IN SILICON - A NEW MODEL

被引：67

作者：

GOSELE, U

MOREHEAD, F

FRANK, W

SEEGER, A

机构：

[1] MAX PLANCK INST MET RES,INST PHYS,D-7000 STUTTGART 1,FED REP GER

[2] UNIV STUTTGART,INST THEORET & ANGEW PHYS,D-7000 STUTTGART 80,FED REP GER

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 03期

关键词：

D O I：

10.1063/1.92285

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：157 / 159

页数：3

相关论文

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