LATTICE-DEFECTS IN AS-IMPLANTED AND CW ND-YAG LASER-ANNEALED SILICON

被引:10
作者
ISHIDA, K
OKABAYASHI, H
YOSHIDA, M
机构
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D O I
10.1063/1.91814
中图分类号
O59 [应用物理学];
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页码:175 / 177
页数:3
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