PLASMA-FOCUS X-RAY SOURCE FOR LITHOGRAPHY

被引：67

作者：

KATO, Y

OCHIAI, I

WATANABE, Y

MURAYAMA, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584044

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：195 / 198

页数：4

共 10 条

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