STUDY OF THE PD/SI(100)2X1 SYSTEM USING SOFT X-RAYS

被引：6

作者：

KAWAMOTO, S

SAITOH, K

HIRAI, M

KUSAKA, M

IWAMI, M

机构：

[1] Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okayama

来源：

SURFACE SCIENCE | 1993年 / 287卷 / pt A期

关键词：

D O I：

10.1016/0039-6028(93)90760-H

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Si crystal is well known to show a room-temperature alloyed interface formation (RTAIF) when it is brought into contact with a metal overlayer. In the present study, we have used photoemission spectroscopy (PES) using synchrotron radiation (SR) in the soft X-Tay region to elucidate the initial stage of the silicide growth in Pd/Si(100)2 x 1 al room temperature. We propose that the chemical bonding model can explain the RTAIF in the Pd/Si(100)2 x 1 system.

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收藏

页码：151 / 154

页数：4

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