INTERFACE MORPHOLOGY IN CHEMICAL VAPOR-DEPOSITION ON PROFILED SUBSTRATES

被引:16
作者
VANDENBREKEL, CHJ
JANSEN, AK
机构
关键词
D O I
10.1016/0022-0248(78)90348-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:488 / 496
页数:9
相关论文
共 10 条
[1]   DEPOSITION AND PROPERTIES OF SILICON ON GRAPHITE SUBSTRATES [J].
CHU, TL ;
MOLLENKOPF, HC ;
CHU, SSC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (01) :106-110
[2]   A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR [J].
EVERSTEYN, FC ;
SEVERIN, PJW ;
BREKEL, CHJV ;
PEEK, HL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) :925-+
[3]  
JANSEN AK, 1978, J CRYST GROWTH, V43, P371, DOI 10.1016/0022-0248(78)90396-2
[4]   THE DEBORAH NUMBER [J].
REINER, M .
PHYSICS TODAY, 1964, 17 (01) :62-62
[5]   BEHAVIOR OF LARGE-SCALE SURFACE PERTURBATIONS DURING SILICON EPITAXIAL GROWTH [J].
RUNYAN, WR ;
ALEXANDER, EG ;
CRAIG, SE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (11) :1154-+
[6]  
SHAW DW, 1975, CRYSTAL GROWTH CHARA, P207
[7]   EPITAXIAL DEPOSITION OF SILICON IN DEEP GROOVES [J].
SMELTZER, RK .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1666-1671
[8]  
VANDENBREKEL CHJ, 1977, PHILIPS RES REP, V32, P118
[9]  
VANDENBREKEL CHJ, 1977, PHILIPS RES REP, V32, P134
[10]   MORPHOLOGICAL STABILITY ANALYSIS IN CHEMICAL VAPOR-DEPOSITION PROCESSES .1. [J].
VANDENBREKEL, CHJ ;
JANSEN, AK .
JOURNAL OF CRYSTAL GROWTH, 1978, 43 (03) :364-370