COMPARISON OF PHOSPHOSILICATE GLASS-FILMS DEPOSITED BY 3 DIFFERENT CHEMICAL VAPOR-DEPOSITION METHODS

被引：27

作者：

SHIOYA, Y

MAEDA, M

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 09期

关键词：

D O I：

10.1149/1.2109054

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1943 / 1950

页数：8

共 13 条

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[9] THERMAL-STRESS IN CVD PSG AND SIO2-FILMS ON SILICON SUBSTRATES [J].

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