CHARACTERIZATION OF DEFECTS INTRODUCED DURING DC MAGNETRON SPUTTER DEPOSITION OF TI-W ON N-SI

被引：16

作者：

AURET, FD ^{[1
]}

NEL, M ^{[1
]}

BOJARCZUK, NA ^{[1
]}

机构：

[1] IBM CORP,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 05期

关键词：

D O I：

10.1116/1.583477

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1168 / 1174

页数：7

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