共 11 条
[5]
0.1-MU SCALE LITHOGRAPHY USING A CONVENTIONAL ELECTRON-BEAM SYSTEM
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (01)
:131-135
[6]
8 NM WIDE LINE FABRICATION IN PMMA ON SI WAFERS BY ELECTRON-BEAM EXPOSURE
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1985, 24 (10)
:L809-L811
[7]
Furuya K., 1988, Transactions of the Institute of Electronics, Information and Communication Engineers E, VE71, P286