CHEMICAL ETCHING OF INGAASP/INP DH WAFER

被引：54

作者：

ADACHI, S

NOGUCHI, Y

KAWAGUCHI, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 05期

关键词：

D O I：

10.1149/1.2124014

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1053 / 1062

页数：10

相关论文

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