Thickness dependence of ferroelectricity in heteroepitaxial BaTiO3 thin film capacitors

被引:132
作者
Yanase, N [1 ]
Abe, K [1 ]
Fukushima, N [1 ]
Kawakubo, T [1 ]
机构
[1] Toshiba Corp, R&D Ctr, Adv LSI Technol Lab, Saiwai Ku, Kawasaki, Kanagawa 2108582, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 9B期
关键词
ferroelectric hysteresis; barium titanate; heteroepitaxial growth; sputtering;
D O I
10.1143/JJAP.38.5305
中图分类号
O59 [应用物理学];
学科分类号
摘要
Heteroepitaxial BaTiO3 films of various thicknesses ranging from 12 nm to 79 nm were prepared on SrRuO3/SrTiO3 substrates by radio-frequency magnetron sputtering employing a two-step deposition technique, and the crystallographic and ferroelectric properties of the heteroepitaxial films were evaluated. A ferroelectric hysteresis loop was clearly observed in the heteroepitaxial BaTiO3 films even when the thickness was reduced to 12 nm, probably due to improved crystallinity at the interface between the ferroelectric film and the electrodes through optimization of the preparation technique. The observation of hysteresis at the temperature of 200 degrees C was explained in terms of modification of the Curie temperature from the inherent 130 degrees C to far above 200 degrees C by lattice misfit strain. A possible relationship between the artificially raised Curie temperature and the limited thickness dependence of ferroelectricity was discussed.
引用
收藏
页码:5305 / 5308
页数:4
相关论文
共 14 条
[1]   Ferroelectricity of heteroepitaxial Ba0.6Sr0.4TiO3 ultrathin films [J].
Abe, K ;
Komatsu, S ;
Yanase, N ;
Sano, K ;
Kawakubo, T .
INTEGRATED FERROELECTRICS, 1997, 17 (1-4) :89-96
[2]  
Abe K, 1998, IEICE T ELECTRON, VE81C, P505
[3]   Modification of ferroelectricity in heteroepitaxial (Ba,Sr)TiO3 films for non-volatile memory applications [J].
Abe, K ;
Yanase, N ;
Sano, K ;
Izuha, M ;
Fukushima, N ;
Kawakubo, T .
INTEGRATED FERROELECTRICS, 1998, 21 (1-4) :197-206
[4]   Asymmetric ferroelectricity and anomalous current conduction in heteroepitaxial BaTiO3 thin films [J].
Abe, K ;
Komatsu, S ;
Yanase, N ;
Sano, K ;
Kawakubo, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (9B) :5846-5853
[5]   Ferroelectric properties in heteroepitaxial Ba0.6Sr0.4TiO3 thin films on SrRuO3/SrTiO3 substrates [J].
Abe, K ;
Komatsu, S ;
Yanase, N ;
Sano, E ;
Kawakubo, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (9A) :5575-5579
[6]  
ABE K, 1995, MATER RES SOC SYMP P, V361, P465
[7]   FERROELECTRIC PROPERTIES IN EPITAXIALLY GROWN BAXSR1-XTIO3 THIN-FILMS [J].
ABE, K ;
KOMATSU, S .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (12) :6461-6465
[8]   FABRICATION AND PROPERTIES OF EPITAXIAL FERROELECTRIC HETEROSTRUCTURES WITH (SRRUO3) ISOTROPIC METALLIC OXIDE ELECTRODES [J].
EOM, CB ;
VANDOVER, RB ;
PHILLIPS, JM ;
WERDER, DJ ;
MARSHALL, JH ;
CHEN, CH ;
CAVA, RJ ;
FLEMING, RM ;
FORK, DK .
APPLIED PHYSICS LETTERS, 1993, 63 (18) :2570-2572
[9]   Thickness transitions of ferroelectricity in thin films [J].
Ishibashi, Y ;
Orihara, H ;
Tilley, DR .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1998, 67 (09) :3292-3297
[10]   Ferroelectric properties of SrRuO3/(Ba,Sr)TiO3/SrRuO3 epitaxial capacitor [J].
Kawakubo, T ;
Komatsu, S ;
Abe, K ;
Sano, K ;
Yanase, N ;
Fukushima, N .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (9B) :5108-5111